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Image Search Results
Journal: Journal of Neural Engineering
Article Title: The geometry of photopolymerized topography influences neurite pathfinding by directing growth cone morphology and migration
doi: 10.1088/1741-2552/ad38dc
Figure Lengend Snippet: Schematic of photopatterning process and pattern characterization. (A) Schematic of photopolymerizing micropatterned substrates. A monomer solution (yellow) is added to a silane coupled glass cover slip (grey). Then the photomask (black outlined pattern) is placed on top of the solution before exposing the system to UV (ultraviolet, 355 nm) light. The monomer polymerizes to form a solid substrate and the photomask is removed. Schematic is representative and not to scale. (B) The photomask (black). This pattern repeats over the photomask to create the topographically micropatterned substrate. (C) A depth, color-coded confocal microscopy image of multi-angled microfeatures patterned in the substrate surface. Scale bars = 100 μ m.
Article Snippet: Then, to create the patterned substrates, this solution was evenly dispersed on a silane-coupled piece of cover glass by placing
Techniques: Confocal Microscopy